Theory Analysis of Grating Production with Phase Masks

Liu Yonghong\ \ Huang Dexiu

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Theory Analysis of Grating Production with Phase Masks

- Theory Analysis of Grating Production with Phase Masks
- Study on Optical communication Issue 2, (1997)
- 作者机构：
  
  1. 华中理工大学
  2. 河南省机械设备进出口公司
  3. 华中理工大学河南省机械设备进出口公司
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN253
- Published：1997，
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[1]刘永红,黄德修,王黎,郭健明.相位掩模法制作光纤光栅的研究[J].光通信研究,1997(02):48-52.

Liu Yonghong\ \ Huang Dexiu. Theory Analysis of Grating Production with Phase Masks. [J]. (2).(1997)
[1]刘永红,黄德修,王黎,郭健明.相位掩模法制作光纤光栅的研究[J].光通信研究,1997(02):48-52. DOI：

Liu Yonghong\ \ Huang Dexiu. Theory Analysis of Grating Production with Phase Masks. [J]. (2).(1997) DOI：

摘要

准分子激光照射相位掩模后，在近场形成周期的条纹分布，利用近场光强对光敏光纤进行曝光，可以在纤芯中写入光栅。从衍射的频谱理论出发，导出具有一定发散角的准单色准分子激光照射掩模时产生的近场光强分布。分析了光源发散角及掩模衍射特性对纤芯近场光强分布及光纤光栅制作的影响。并把分析结果与实验现象进行了比较。

Abstract

When excimer Laser irradiate phase masks

the periodic fringe patterns are formed in near field

exposing fibers to it

in core gratings can be induced.In this paper

according to spectrum theories of diffraction

we access the near field intense distributions produced by a periodic mask exposed using an quasimonochromatic excimer laser with a certain divergence

the influence of beam divergence and phase mask characterization on the intense distribution and production of fiber grating is analysized.Results is compared with experiment.

关键词

相位掩模光纤光栅近场光强分布

Keywords

phase mask\ fiber grating\ near field intense distribution

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Information Optics Engineering Institute,Soochow University

苏州大学信息光学工程研究所江苏苏州215006

Institute of Lightwave Technology, Northern Jiaotong University,\ Beijing\

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