Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod

Yang Xinming

doi:10.13756/j.gtxyj.1991.04.004

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Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod

- Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod
- Study on Optical communication Issue 4, Pages: 34-37(1991)
- 作者机构：
  
  武汉电信器件公司工程师
- 作者简介：
- 基金信息：
- DOI：10.13756/j.gtxyj.1991.04.004
  CLC：
- Published：1991，
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[1]杨新民.抗蚀剂组合法制造DFB激光器λ/4相移光栅[J].光通信研究,1991(04):34-37.

Yang Xinming. Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod. [J]. (4):34-37(1991)
[1]杨新民.抗蚀剂组合法制造DFB激光器λ/4相移光栅[J].光通信研究,1991(04):34-37. DOI： 10.13756/j.gtxyj.1991.04.004.

Yang Xinming. Fabrication ofλ/4-shifted Grating for DFB Lasers by Positive and Negative Photoresist Mothod. [J]. (4):34-37(1991) DOI： 10.13756/j.gtxyj.1991.04.004.

摘要

本文介绍用正、负光致抗蚀剂组合的方法

制造用于DFB激光器λ/4相移光栅的原理及工艺

并给出了研究结果和质量评价。光栅周期为4600A

相移转换区小于3μm。

Abstract

λ/4-shifted grating for DFB lasers has been successfully fabricated by the method of positive and negative photoresist. In this paper

the principle and fabrication process are described in detail

and the results and the quality evaluation are presented. The corrugation periods were about 4600A The quarter-wave phase shift transition width of the gratings were less than 3μm.

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