Study on Ti Film Magnetic Control Sputtering and Optical Absorption Characteristics

Chen Shanbao   Lin Gengqi

doi:10.13756/j.gtxyj.1998.01.011

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Study on Ti Film Magnetic Control Sputtering and Optical Absorption Characteristics

- Study on Ti Film Magnetic Control Sputtering and Optical Absorption Characteristics
- Study on Optical communication Issue 1, Pages: 46-49(1998)
- 作者机构：
  
  1. 华中理工大学!430074
  2. 邮电部固体器件研究所!430074
- 作者简介：
- 基金信息：
- DOI：10.13756/j.gtxyj.1998.01.011
  CLC： TN304.055
- Published：1998，
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[1]陈善宝,林更琪,方罗珍,吴爱清.Ti膜磁控溅射及光吸收特性研究[J].光通信研究,1998(01):46-49.

Chen Shanbao Lin Gengqi. Study on Ti Film Magnetic Control Sputtering and Optical Absorption Characteristics. [J]. (1):46-49(1998)
[1]陈善宝,林更琪,方罗珍,吴爱清.Ti膜磁控溅射及光吸收特性研究[J].光通信研究,1998(01):46-49. DOI： 10.13756/j.gtxyj.1998.01.011.

Chen Shanbao Lin Gengqi. Study on Ti Film Magnetic Control Sputtering and Optical Absorption Characteristics. [J]. (1):46-49(1998) DOI： 10.13756/j.gtxyj.1998.01.011.

摘要

介绍了射频磁控溅射金属Ti膜工艺

对Ti膜光吸收特性进行了测试

用经典电子理论分析了光吸收机理。

Abstract

The technique of RF magnetic control sputtering metallic Ti film has been introduced in this paper. Measurements have been carried out on Ti film optical absorption charateristics and the optical absorption mechanism has been analyzed with the classical electronic theory.

关键词

磁控溅射金属吸收膜光吸收

Keywords

magnetic control sputteringmetallic absorption filmoptical absorption

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