PECVD deposition of silica plane waveguides and the film properties

CHEN Si-xiang~1; JIANG Zheng-feng~1; HU Ye-fa~1; LIU Wen~2

doi:10.13756/j.gtxyj.2005.05.019

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PECVD deposition of silica plane waveguides and the film properties

- PECVD deposition of silica plane waveguides and the film properties
- Study on Optical communication Issue 5, Pages: 68-70(2005)
- 作者机构：
  
  1.   武汉理工大学机电工程学院
  2.   武汉邮电科学研究院湖北武汉430070
  3.   湖北武汉430074
- 作者简介：
- 基金信息：
- DOI：10.13756/j.gtxyj.2005.05.019
  CLC： TN252
- Published：2005，
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[1]陈思乡,江征风,胡业发,刘文.SiO_2平面光波导的PECVD制备和膜层特性研究[J].光通信研究,2005(05):68-70.

CHEN Si-xiang~1, JIANG Zheng-feng~1, HU Ye-fa~1, et al. PECVD deposition of silica plane waveguides and the film properties. [J]. (5):68-70(2005)
[1]陈思乡,江征风,胡业发,刘文.SiO_2平面光波导的PECVD制备和膜层特性研究[J].光通信研究,2005(05):68-70. DOI： 10.13756/j.gtxyj.2005.05.019.

CHEN Si-xiang~1, JIANG Zheng-feng~1, HU Ye-fa~1, et al. PECVD deposition of silica plane waveguides and the film properties. [J]. (5):68-70(2005) DOI： 10.13756/j.gtxyj.2005.05.019.

摘要

研究了等离子体增强化学汽相沉积（PECVD）的光波导膜层的光学特性

论述了沉积工艺参量和退火处理对膜层性能的影响

优化工艺获得了高质量的波导膜层

成功设计制作了在1 550 nm中心波长损耗低于0.1 dB/cm的平面光波导和阵列波导光栅（AWG）器件。

Abstract

This paper studied the optical properties of SiO

layers obtained by use of plasme-enhanced chemical vapor deposition （PECVD）

expounded the effect of deposition parameters and annealing on the layer properties. Through optimization of process technology

we obtained high-quality waveguide film layer and fabricated low-loss planar optical waveguide and AWG devices whose propagation loss is less than 0.1 dB/cm at 1 550 nm （center wavelength）.

关键词

平面光波导SiO2波导等离子体增强化学汽相沉积

Keywords

planar optical waveguidesilica waveguidesPECVD

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