Investigation on the Power Coupling Between Metal-Insulator-Metal Plasmonic and Dielectric Slab Waveguides

CHEN Hua-yang; GUAN Jian-fei

doi:10.13756/j.gtxyj.2017.02.019

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Investigation on the Power Coupling Between Metal-Insulator-Metal Plasmonic and Dielectric Slab Waveguides

- Investigation on the Power Coupling Between Metal-Insulator-Metal Plasmonic and Dielectric Slab Waveguides
- Study on Optical communication Issue 2, Pages: 65-67(2017)
- 作者机构：
  
  南京邮电大学光电工程学院
- 作者简介：
- 基金信息：
- DOI：10.13756/j.gtxyj.2017.02.019
  CLC： TN256
- Published：2017，
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[1]陈华阳,关建飞.MIM等离子波导与介质平板波导耦合性分析[J].光通信研究,2017(02):65-67.

CHEN Hua-yang, GUAN Jian-fei. Investigation on the Power Coupling Between Metal-Insulator-Metal Plasmonic and Dielectric Slab Waveguides. [J]. Study on Optical communication (2):65-67(2017)
[1]陈华阳,关建飞.MIM等离子波导与介质平板波导耦合性分析[J].光通信研究,2017(02):65-67. DOI： 10.13756/j.gtxyj.2017.02.019.

CHEN Hua-yang, GUAN Jian-fei. Investigation on the Power Coupling Between Metal-Insulator-Metal Plasmonic and Dielectric Slab Waveguides. [J]. Study on Optical communication (2):65-67(2017) DOI： 10.13756/j.gtxyj.2017.02.019.

摘要

提出了一种新型MIM（金属-介质-金属）等离子光波导与二维介质平板波导耦合器结构

该结构通过利用波导接口处的谐振效应来增大波导之间的耦合效率

降低传输损耗。采用FDTD（有限时域差分）法进行了数值计算

结果表明

在波长1.55μm处

谐振腔距离接口230nm、深度为420nm时耦合效率得到大幅度提高

耦合效率比传统的耦合结构模型能够提高20%

0%。

Abstract

In this paper

we present a new model for a nano-coupler between metal-insulator-metal plasmonic and dielectric slab waveguides.The model uses the resonance effect at the waveguide junction to improve the power coupling efficiency.The proposed model is demonstrated numerically by the Finite-Different Time-Domain（FDTD）method.The results indicate that when wavelength is 1.55μm the distance between resonator with junction is 230 nm and the depth is 420 nm

where the power coupling will be improved by 20%to 30%.

关键词

金属-介质-金属结构波导接口耦合效率光学谐振腔

Keywords

metal-insulator-metalwaveguide junctionpower couplingoptical resonator

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